The DC/Pulse bias power supply is commonly used in electrical arc ion plating
DC/Pulse Bias Power Supply
The DC/Pulse bias power supply is commonly used in electrical arc ion plating, DC magnetron sputtering, magnetron sputtering ion plating, unbalanced magnetron sputtering, and twin magnetron sputtering systems for substrate bias during film deposition.
The main features of these power inverters include: glow discharge substrate surface cleaning, ion bombardment during thin film deposition, substrate surface temperature control and so on. Using proper biasing parameters, one not only can avoid surface arcing to increase products yield but also can enhance surface smoothness and thin film/substrate adhesion. When using pulsed biasing, the arcing energy can be restrained during glow discharge and thin film deposition to ensure an excellent substrate surface without damage. Besides, a higher bias voltage can be applied in the pulsed bias mode than that in the DC bias mode, and the substrate temperature can be controlled via the adjustment of the pulsing frequency and duty cycle.
Three operation modes: DC, Pulse, DC superposed Pulse.
The power supply is specially suitable for low-temperature, high-deposition-rate and high-quality coating systems.
The deposition rate, adhesive force, and temperature can be enhanced by adjusting the frequencies and duty cycles.
Advanced switching technology with small footprint, stable operation, low noise, and low electrical interference
Auto current stabilizing function rednering stable operation under highly fluctuating electrical load
Multiple circuit protection modes in the BP Series reducimg frequent arcing during operation and enabling continuous and stable operation under high-frequency arcing without circuit damage
Multiple output modes on front panel facilitating flexible adjustment of the pulse bias, pulse duration, pulse frequency and so on